Lithography optics

Optics for photolithography applications must adhere to exceedingly tight tolerances for transmitted wavefront quality. These optics may function at deep ultraviolet  (DUV) wavelengths. The challenges are numerous for these measurements, including the need to protect the exotic coatings of the test and reference optics,  high power sources to generate sufficient beam contrast, etc.

The FizCam DUV dynamic laser interferometer measures microlithography optics and optical systems at deep ultra-violet (DUV) wavelengths. Acquiring data in less than 1 millisecond the FizCam DUV can measure accurately despite the heavy vibration and air turbulence typical of DUV compliant clean rooms.